We provide increased abrasive particle size silica colloidal for C-plane sapphire, also provide alumina slurry for C-plane sapphire with a faster removal rate and controlled surface finish.

Kona's C-Plane sapphire rough and final polishing slurry is a high-performance product designed to meet the specific requirements of C-plane sapphire polishing. Our slurry is formulated with high-quality particles to provide a rapid removal rate of material and a controlled surface finish. Our rough polishing slurry is ideally suited for removing deeper scratches, while the final polishing slurry provides a smooth surface finish. The slurry works effectively with a wide range of polishing machines and pads, making it versatile and efficient. Additionally, we provide technical support to ensure customers receive the maximum performance and efficiency from our C-Plane Sapphire Rough and Final Polishing Slurry.