Sapphire wafer is the most widely used substrate material in the semiconductor lighting industry，we developed Silica Colloidal and Alumina Slurry for sapphire substrate polishing.

Kona's Sapphire Substrate Polishing Slurry is designed to meet the demanding requirements of polishing sapphire substrates. Our colloidal silica slurries provide a superior surface finish with no compromise on polishing rates. With high-purity raw materials, our alumina slurries are idealy designed for C-plane sapphire with a fast removal rate and controlled surface finish. The slurry range is available in a wide range of particle sizes to cater to different polishing needs, including fine and rough polishing. Additionally, our Sapphire Substrate Polishing Slurry is compatible with various polishing machines and ads and provides cost-effective solutions for sapphire substrate polishing.