Polishing Slurry Supplier, Cerium Oxide Slurry Alumina Polishing Powder Wholesale| Kona

Glass & Lenses Polishing Powder & Slurry

Kona has developed Cerium Oxide Slurry for a wide variety of glass materials, especially for Industrial production and processing.

Cerium Oxide Slurry for Quartz Glass

Quartz Glass Polishing Slurry has been developed for industrial glass polishing, such as STP for Quartz Glass.

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Plastic Lens Polishing Slurry

Kona has developed Plastic Lens Polishing Slurry for eyes lenses, resin-based prescription lenses, providing high quality polished surfaces and removal rate.

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Glass (Silicate and Special) Polishing Slurry

Kona has developed Glass Polishing Slurry for a wide variety of glass materials, providing high quality polished surfaces and removal rate.

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Formulated High Ceria Polishing Powder for Glass

Formulated high cerium oxide polishing powder is more suitable for precision polishing. For example, mobile phone cover glass polishing, optical flat glass polishing, watch dial polishing and so on.

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Metal Mirror Polishing Slurry

We have engineer with more than ten years experience in lapping and polishing slurry Research and Development. Fast removal rate and good surface roughness and finish, creating a mirror-like surface.

Stainless Steel Polishing Slurry

Our Stainless Steel Polishing Slurry KN-103 Series is popular among our users. The SSP Slurry has fast removal rate and good surface roughness , creating a mirror-like surface.

Aluminum Alloy Polishing Slurry

According to the material characteristics of Aluminum Alloy, the Aluminum Alloy Lapping and Polishing Slurry we developed has high polish rate, good surface and mirror finishing.

Powder Metal Polishing Slurry

Powder Metal Products have high hardness and are difficult to polish. The Powder Metal Polishing Slurry developed by our company according to the characteristics of powder metal has high efficiency and high finish, creating a mirror-like surface.

Copper Polishing Slurry

Kona has created a water-based polishing slurry that consists of nano alumina particles, which is specially designed to meet the requirements of copper material and 3C fabrication process. This formulation ensures that the polishing rate remains intact while delivering a remarkable surface finish.

Sapphire Polishing Slurry

Kona series Sapphire Polishing Slurry is developed for kinds of Sapphire products, such as the sapphire lens and sapphire substrate. Our Colloidal silica provides a good surface finish with no compromise with polish rate, and alumina slurry is especially suitable for C-plane sapphire with a fast removal rate and controlled surface finish.

A-Plane Sapphire Colloidal Silica

Sapphire Colloidal Silica especially developed for Sapphire, with silica nanoparticles, after polishing process, you can get a good surface finish.

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C-Plane Sapphire Rough and Final Polishing Slurry

Aluminium rough and final polishing slurry developed for C- Plane Sapphire, with a fast removal rate and controlled surface finish.

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C-Plane Sapphire Rough and Final Polishing Slurry

Sapphire Substrate Polishing Slurry

Aluminium rough and final polishing slurry developed for sapphire substrate, with a fast removal rate and controlled surface finish.

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Sapphire Window Polishing Slurry

Sapphire Window Polishing Slurry is designed for quality sapphire window, we try to balance both high quality surface and fast removal rate.

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Ceramic Polishing Slurry

Ceramic Polishing Slurry is researched and developed for ceramic substrate, helping Precision Ceramics substrate fab to reach a desired surface finish.

Aluminum Nitride Ceramic Lapping & Polishing Slurry

Aluminum Nitride Ceramic Lapping & Polishing Slurry is developed for AlN products such as electronic applications AlN Substrate, with a good surface finish and removal rate.

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Alumina Ceramics Lapping & Polishing Slurry

Alumina Ceramics Polishing Slurry is developed for Alumina Ceramics products such as Alumina Ceramics Substrate with a good surface flatness, finish and removal rate.

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Copper-Covered Ceramic/AMB Substrate Polishing Slurry

CCL Polishing Slurry is developed for Copper Metal Material products such as Copper Clad Laminates, with a good surface flatness, finish and removal rate.

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Ceramic Lapping & Polishing Slurry

Kona has developed a series of Lapping & Polishing Slurry for various ceramics, such as Aluminum Nitride Ceramics and Alumina Ceramics, obtaining a smooth surface and increased removal rate.

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Special Material Polishing Slurry

Kona has formulated additional types of polishing slurries or fluids to cater to specific materials, including but not limited to metallographic samples, silicon wafers, and lithium niobate crystals.

Metallographic Specimens Polishing Fluid

Kona has developed colloidal silica for Metallograpic Polishing, for example Coal Rock Metallograpic Polishing, providing a highly reflective finish, the Metallograpic samples can be examined on the microscope.

Silicon Wafer Polishing Colloidal Silica

Kona Silicon Wafer Slurry has developed for silicon wafer grinding and final polishing process. During CMP of silicon substrate, Kona slurry obtain a super-smooth surface, and help you to cost down.

Lithium Niobate Crystal Polishing Colloidal Silica

Kona Special Colloidal Silica has been developed for Crystal polishing process, such as Lithium Niobate (LiNbO3), providing excellent surface finishes. We also has developed lapping or fine polishing slurry for a wide variety of Crystal Materials.

Alumina Polishing Powder

Kona offers a wide particle size range of Alumina Polishing Powder, from 0.2µm to 5µm. Fine alumina polishing powders provide quality polished surfaces, and lapping powder provides a high removal rate.

Alumina Polishing Powder 0.3 Microns

Nano alumina powder not only has the characteristics of stable wear resistance of α-alumina powder, but also has nano effect. The surface tension of abrasive powder is large and the binding force is strong.

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Alumina Polishing Powder 0.6µm Wholesale White Fused Alumina Powder Suppliers | Kona

Nano-alumina powder has good chemical stability and adsorption ability, and can be good suspended in aqueous solution to prepare nano-alumina slurry. The suspension is used for CMP polishing.

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Alumina Polishing Powder 1 Micron

α-alumina powder has strong chemical stability and high Mohs hardness. The polishing slurry made of this particle size alumina powder can not only obtain good surface but also have excellent removal rate.

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Alumina Lapping Powder 3 Microns

The micron grade aluminum oxide powder has good dispersion, high cutting force, and can be used as water-based suspension for polishing, which can achieve good surface and fast removal rate.

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Spherical Silica Powder

Kona has developed Spherical Silica Powder for high-performance applications, especially for cosmetic filler, such as lipstick filler, powder filling, eyeshadow filler, mascara filler and so on.

Spherical Silica Powder

Kona has developed Spherical Silica Powder for high-performance applications, especially for cosmetic filler, such as lipstick filler,powder filling, eyeshadow filler,mascara filler and so on.

Spherical Silicon Dioxide Powders

Spherical Silica Powder-used in lipstick and other makeup.

Spherical SiO2 Powders

Silica is not only an ingredient used in mineral makeup, but also used in lipstick, eyeshadow, mascara and other cosmetics.

Alumina Polishing Slurry and Silica Colloidal & Powder Specialist

We have experienced technology and sales specialists focusing on Alumina Polishing Slurry and Powders, Silica Colloidal and Spherical Silica Powders. From Metal Mirror Finish Polishing Slurry to Cosmetic Silica Powders, we have experienced solutions for you. Our Stainless Steel Polishing Slurry KN-103 Series is popular among our users, and is sold Over hundreds of Tons per year. Looking forward to hearing from you!

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Long Slurry Life

Kona lapping & polishing slurry and powders offers superior durability and long-lasting slurry life, especially our alumina polishing slurry and Cerium oxide polishing slurry can be used for over one month before being totally replaced in some of our clients' workshop.

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Fast Removal Rate

Kona lapping & polishing slurry and powders provides a fast removal rate, especially our alumina polishing slurry which has a high polish rate, much more than colloidal silica for a lot of polishing materials. And of course, if you can work with an appropriate polishing pad, even much faster.

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High Quality Mirror Finish

Our polishing slurry based on nano abrasives provides a fast polishing rate with no compromise on a high-quality mirror-like finish surface. A lot of materials need to be polished into a mirror-like finish. And our colloidal silica can provide a high-reflective polishing surface.

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Customize for Different Polishing

We have the ability to customize the polishing slurry according to your material. Choose different abrasives, from alumina、silica to ceria; choose different particle sizes, from nano to micro, customize acid, alkaline, and neutral slurry according to your needs.

Certificate About Our Products & Enterprise

product safety certificate from shanghai institute of chemical technology

member certificate of the china abrasives association english

member certificate of the china abrasives association chinese

abrasive a abrasives trade association membership certificate

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News About Kona & Related Industries

Nov 24

What is the Suitable Compound for Polishing A-Phase &C-Phase Sapphire?

As industries embrace the durability and optical clarity of sapphire, from LED Substrates to Consumer Electronics, Sapphire plays an important and expanding role. Basically, Sapphire Substrate is more using C-phase sapphire, and A-phase sapphire is more widely used as the window piece. Regardless of A-phase or C-phase sapphire, it is suitable for polishing in CMP method, and nano meter silica colloidal is very suitable used as abrasives in CMP polishing process. And our company can afford silica sol with increased particle size on the nanoscale not only ensures a good surface finish but also enhances the efficiency of the polishing process.