Advancements in Semiconductor Materials and Polishing Solutions

In a significant breakthrough for the computer industry, 

the introduction of the crystal valve in 1947 revolutionized the way computers operated.

Early computers relied on valves to control the flow of electricity, a process that made them bulky and slow. 

However, the advent of the crystal valve in America in 1947 marked a turning point, 

propelling the rapid development of computers as we know them today.

The crystal valve, also known as a semiconductor, became the game-changer. 

Unlike traditional valves, semiconductors are materials that possess properties between conductors and insulators. 

This unique characteristic eliminated the need for physical switches to control the flow of electricity, ushering in a new era of computing.

With the implementation of semiconductors, computers were able to develop at an unprecedented pace. 

The ability to manipulate the flow of electricity using semiconductor materials opened up a world of possibilities. 

The electricity industry, computer industry, and even the AI industry we witness today have all greatly benefited from this breakthrough.

The first generation of semiconductors included materials such as silicon (Si) and germanium (Ge). 

These semiconductors paved the way for the miniaturization of computers, 

making them more accessible to the masses. 

The second generation of semiconductors introduced gallium arsenide (GaAs) and indium phosphide (InP), 

which further improved the performance and efficiency of computers.

The third generation of semiconductors, gallium nitride (GaN), and silicon carbide (SiC), have taken the industry by storm. 

These advanced materials offer enhanced power capabilities and better thermal management, allowing for the creation of more powerful and energy-efficient devices.

In the rapidly evolving practical application market, the coexistence of various semiconductor materials has become a common phenomenon. 

Recognizing this trend, our company can offer tailored solutions to meet the diverse needs of our customers. 

We provide specialized colloidal silica polishing suspension for both first-generation silicon wafers and second-generation semiconductor materials. 

Additionally, we are making significant strides in the development of alumina polishing slurry for the third-generation semiconductor material, silicon carbide.

As the industry progresses, the focus has now shifted to the third-generation semiconductor material, silicon carbide (SiC).

 Known for its excellent thermal conductivity and high-temperature stability, 

SiC is gaining popularity in power electronics, automotive applications, and renewable energy systems. 

To cater to this emerging market, our company is actively developing alumina polishing slurry tailored for SiC. 

We hope to collaborate with our customers for mutual success and play a small role in the wave of the semiconductor industry.