Company News - Changsha Kona Fine Chemical Co., Ltd.

10 02, 2025

How to Choose the Befitting Abrasive for CMP Polishing

As integrated circuit technology advances, the demand for flatness between material layers in semiconductor manufacturing becomes increasingly crucial, driven by smaller feature sizes and the realization of high-density devices. Chemical Mechanical Polishing (CMP) has emerged as the key technology for achieving global planarization, addressing the heightened requirements for surface quality and processing efficiency in semiconductor fabrication and optical material production.

21 01, 2025

Unlock Precision Polishing: Key Factors for Selecting CMP Pads in Precision Machining

In the world of Chemical Mechanical Polishing (CMP), selecting the right polishing pad is crucial for achieving superior surface finishes across various materials, from metals to ceramics. This comprehensive guide delves into the key considerations for choosing the perfect polishing pad, emphasizing the significance of material properties, pad structure, and compatibility with polishing slurries to ensure efficiency and quality in precision machining processes.

10 01, 2025

Shining Innovations: How Advanced Polishing Techniques Transform Durable Consumer Products

In the competitive world of industrial design, creating durable consumer products that marry functionality and aesthetic appeal is paramount. From stainless steel smartphone frames to precision polishing machines, manufacturers are leveraging advanced materials and innovative polishing techniques to achieve mirror-like finishes that not only protect the core structures but also captivate consumers. As the demand for high-quality, stylish products grows, the intersection of engineering excellence and artistic design becomes increasingly vital in shaping the future of modern electronics.

15 11, 2024

What is the Suitable Compound for Polishing A-Phase &C-Phase Sapphire?

As industries embrace the durability and optical clarity of sapphire, from LED Substrates to Consumer Electronics, Sapphire plays an important and expanding role. Basically, Sapphire Substrate is more using C-phase sapphire, and A-phase sapphire is more widely used as the window piece. Regardless of A-phase or C-phase sapphire, it is suitable for polishing in CMP method, and nano meter silica colloidal is very suitable used as abrasives in CMP polishing process. And our company can afford silica sol with increased particle size on the nanoscale not only ensures a good surface finish but also enhances the efficiency of the polishing process.

14 10, 2024

Enhancing Cosmetics with Silica Powder: A Guide to Choosing the Right Silica Powder Filler

In the dynamic realm of cosmetics, the choice of fillers can significantly influence product performance and consumer satisfaction. Among these, silica powder stands out as a versatile ingredient, enhancing texture, adhesion, and longevity in formulations. However, with various types of silica powder available, understanding how to select the right one is crucial for achieving optimal results. This article explores the key factors in choosing suitable silica powder fillers for cosmetics, including morphology, specific surface area, and surface treatment, providing valuable insights for formulators aiming to create high-quality, effective beauty products.

09 10, 2024

Advances in Cosmetic Formulations: Silica's Role in Enhancing Texture and Skin Feel

Spherical silica has emerged as a key ingredient, revolutionizing the way makeup interacts with the skin and enhancing overall performance. Silica, a natural non-metallic mineral found abundantly on Earth, plays a crucial role in a variety of cosmetic formulations, including foundations, creams, lotions，lipstick and eyeshadow. Hydrophobic treated spherical silica powder can better fit with the skin and is not easy to wear makeup.

08 10, 2024

The Stainless Steel Used in 3C Electronics and Furniture Applications Need to be Polished into a Mirror-like Surface

Stainless steel, renowned for its durability and aesthetic appeal, plays a pivotal role in various industries, particularly in the production of 3C electronic consumer goods and furniture. Its exceptional resistance to corrosion, acids, and bases, coupled with high hardness and strength, makes it an ideal choice for both functional and decorative applications. As demands for visually striking stainless steel products rise, achieving a mirror-like finish has become essential, especially in the tech sector. This article explores the meticulous polishing processes that elevate stainless steel components to a flawless, reflective surface, highlighting the innovative KN-103 series of polishing slurry developed to meet these stringent standards.

02 10, 2024

The Crucial Role of Chemical Mechanical Polishing in Silicon Polishing

In the precision-driven world of integrated circuit manufacturing, achieving nanometer-level flatness is crucial, making Chemical Mechanical Polishing (CMP) an indispensable technique. As integrated circuits rely on complex multi-layer three-dimensional wiring, the CMP process is vital for flattening wafer surfaces throughout multiple fabrication cycles. This advanced polishing technology not only ensures that the foundational layers of integrated circuits meet stringent flatness requirements but also finds applications in silicon wafer production and advanced packaging solutions. With the ability to significantly reduce surface roughness from micrometers to nanometers, CMP employs a combination of chemical and mechanical actions, utilizing alkaline silicon dioxide polishing slurries to achieve superior results on large 12 and 18-inch wafers. Interestingly, some customers have shown a preference for our nano-scale alumina polishes for silicon devices like reflectors, highlighting the e

28 09, 2024

Ceramic Substrates Rise to Meet Demands of High-Power Electronic Devices

As electric vehicles, electric trains, and advanced semiconductor technologies accelerate their development, the electronics industry faces critical challenges related to heat management in high-power devices. Traditional substrates are proving inadequate, paving the way for ceramic substrates. The manufacturing process of ceramic substrates involves critical steps such as mixing, shaping, grinding and polishing. Ensuring precision during shaping and sintering is vital, and subsequent surface leveling, grinding, and polishing are required to achieve the desired quality.The aluminum nitride and alumina ceramic substrate polishing slurry developed by our company is widely welcomed by our customers.

14 09, 2024

The Art of Polishing: Reflections on the Mid-Autumn Festival

The moon’s surface, glistening and bright, serves as a metaphor for the results of expert polishing. Yet, like any polished item, it is not without its flaws. Occasionally, the moon displays small dark spots reminiscent of defects that can occur during the polishing process. Other times, it may show subtle wrinkles, akin to the orange peel effect that can also emerge in polished materials. And just as some polished surfaces may exhibit edge collapse, the moon can appear to have small sections missing.

11 09, 2024

Addressing Processing Defects in Silicon Carbide Wafer Polishing: A Call for Precision Polishing Techniques

In the semiconductor industry, the precision machining process for high-performance silicon carbide (SiC) wafers faces a significant challenge due to the emergence of processing defects known as collapse phenomena. These slope-like defects, which can occur even after polishing, stem from microcracks, impurities, and lattice defects within the SiC crystals. Factors such as inadequate polishing techniques, oversized wafers, and unstable polishing slurry have been identified as key contributors to this issue, prompting experts to call for enhanced methods and technologies in wafer preparation to ensure the quality and reliability of next-generation semiconductor devices.

05 09, 2024

How is orange peel produced in the polishing process?

Orange peel and Pock often pose challenges in the polishing process. CMP polishing encompasses two main effects: physical polishing and chemical polishing. The occurrence of orange peel occurs when th...

06 08, 2024

Managing High Temperatures in the Workplace: Ensuring Safety and Equipment Efficiency

Amid soaring temperatures in various parts of China on the second "fu" of the lunar calendar, industrial units are taking extra precautions to combat heat-related challenges. A recent report emphasizes the critical need to regulate temperatures in the storage and use of polishing slurry, highlighting the impact of high temperatures on equipment functionality and chemical reactions. As the heatwave persists, businesses are advised to prioritize temperature control measures to ensure employee well-being and operational efficiency.

19 06, 2024

KONA Company Joins China Abrasives Association, Receives Official Recognition

In a significant milestone for KONA Company, a leading manufacturer of abrasives, the company was formally inducted as a member of the prestigious China Abrasives Association. The official announcement came today as KONA Company received its paper certificate, solidifying its position within the esteemed association.

04 06, 2024

Three Main Types of Sapphire Polishing Slurry

Sapphire, known for its high hardness and low chemical reactivity, has traditionally posed challenges in achieving optimal polishing rates. We understand the importance of achieving fine polishing rates while maintaining good surface quality.We offer silica colloidal with particle sizes in the range of tens of nanometers for sapphire, and silica sol with larger particle sizes of over a hundred nanometers to balance efficiency and surface quality. We also afford alumina polishing powder and slurry, which are primarily used for substrate polishing.

10 05, 2024

Celebrating Kona's Membership in China Abrasives Industry Association

Membership in the Abrasives Industry Association is not granted lightly. It is an honor that comes with strict criteria and requirements, ensuring that only reputable and dedicated organizations join the ranks. One of the fundamental requirements for membership is a minimum of four years of experience in the abrasive abrasives industry.

22 03, 2024

Do You Know the Advantages of Formulated High Cerium Oxide Polishing Powder？

How to determine whether a rare earth polishing powder is high cerium oxide polishing powder or low cerium polishing powder? What are the advantages and disadvantages of cerium oxide polishing powder and slurry? The lack of convenience of cerium oxide polishing powder can be made up by the formula.

08 02, 2024

How to Choose Alumina Polishing Powder

Polishing powder is a key factor in polishing process.When we choose alumina polishing slurry according to the physical and chemical characteristics of the material we are planning to polishing.Secondly, we need to consider the methods and equipment we choose to used. In addition, we should consider the appearance of alumina particles too.Finally, we must fully consider its water solubility and dispersion.

18 01, 2024

The Key Technical Characteristics in Metal Mirror-like Polishing Slurry

There is a problem in metal polishing, which is the conflict between polishing efficiency and the final mirror-like finish. In order to solve this problem, there are strict requirements for the polishing slurry and wax in their abrasive particle size , and high requirements for the the width of the particle size distribution of the abrasive.

12 01, 2024

Stainless Steel Accessories Polishing in 3C Industry

our company has specially developed a precision polishing slurry for stainless steel and other cemented carbide materials, based on α-alumina powder as abrasive, plus additives, it is a suitable polishing slurry for hard metal chemical mechanical polishing process.

10 10, 2023

Cerium Oxide Polishing Powder and Polishing Slurry

Cerium oxide is an important part of rare earth materials with a wide range of uses.Cerium oxide powders with nano and micron meter particle size as precision materials play an important role in many ...

05 09, 2023

Nano and Micron Meter Cerium Oxide Powder and Slurry

cerium oxide is widely used in polishing processes such as manufacturing mobile phone screens, optical glass, integrated circuit boards, flat screen TVS, precision valves, integrated circuits and other high-profit electronics industries.

22 08, 2023

Based on alumina abrasives for silicon carbide polishing

Our company has launched the latest polishing slurry developed for silicon carbide materials, which has high efficiency and good precision. Our company's latest polishing slurry for silicon carbide materials is based on alumina abrasives and added additives suitable for silicon carbide polishing processes. Welcome customers to contact and exchange, and purchase trial.

04 03, 2023

Silicon Carbide (SiC) Slurry is Designed for Silicon Carbide Substrates. Lapping and Polishing Slurry is Developing.

Silicon carbide as the third generation semiconductor, compared with the first generation semiconductor silicon material has a great advantage in band gap width, with the same performance of silicon c...

28 07, 2022

China Hardware Abrasives & Abrasives Exhibition 2023 Will Be Held in Shanghai and Foshan

Organized by the China Hardware Products Association, the China International Hardware Exhibition (CIH) annually showcases leading products and technologies to the global hardware industry and is an a...

09 02, 2022

Organize Employees to Participate in Various Training to Enhance Their Professionalism

Kona is focused on alumina, silicon oxide and cerium oxide materials, mainly focusing on the application of these three materials in the field of filling and consumer electronics related precision mac...